Replacement from brush cleaning! Single-wafer cleaning device (scrubber)
A scrubber that employs a high-pressure jet with numerous proven results. When combined with a soft spray, it enables high-speed processing, high cleaning power, and low chemical consumption through sheet processing.
Our scrubber equipment utilizes a high-pressure jet with our unique special nozzles, achieving high-speed processing and high cleaning power through sheet processing, while also reducing the amount of chemical solution used. The nozzles can be selected from various methods, including high-pressure jet, two-fluid spray, and one-fluid spray, and combinations of these methods are also possible. We have a proven track record not only in wafer cleaning but also in photo mask cleaning. Additionally, there is no re-adhesion of particles, which is a common issue with DIP processing. The cleaning solution used is pure water, but organic solvents such as NMP can also be selected depending on the specifications. 【Features】 ■ High cleaning power with high-pressure jet method ■ Options for two-fluid and one-fluid spray nozzles! ■ Combinations of high-pressure jet with two-fluid and one-fluid sprays are also selectable ■ No particle re-adhesion *Please feel free to contact us for more details.
- 企業：エイ・エス・エイ・ピイ
- 価格：Other
